ligament

Utility patents protect inventions that are a novel, nonobvious, and useful, such as: process innovations, machine innovations, manufacturing innovations, compositions of matter, or incremental improvements from foundational innovations. The three patentability requirements: New and Novel: For a United States patent the invention must never have been made public in any way, anywhere in the world, a year before the date on which an application for a patent is filed. In other countries, you have no one year grace period and require absolute novelty. Original and Nonobvious: An invention involves an inventive step if, when compared with what is already known, it would not be obvious to someone with a good knowledge and experience of the subject, for example, if you just make cosmetic changes that is obvious. Useful: This means that the invention must take the practical form of an apparatus or device, it has to do something.

A single patent may be worth a billion dollars, another may be completely worthless. How can you discern such differences? With millions of patent documents (both issued patents and applications), there is a lot of information, that if properly leveraged with the correct technologies, can actually help us discern effectively. Benefits of www.ipstreet.com include: (1) All U.S. patent documents from 1976—present (2) [Forthcoming: International patent documents] (3) Unified Search (Boolean Text Search) (4) Concept Search (using Latent Semantics) (5) Meaningful, graphical results (6) Web-based, no installation required (7) Secure transactions and (8) Immediate Access.

You need IP intelligence to meet corporate objectives related to your business function. If you are a HR director, you can utilize TalentScout™ to identify the inventors that are essential to corporate success. If you are an IP portfolio manager, you can utilize our tools to identify the IP landscape. If you are a licensing executive, you can utilize our tools to identify potential inbound and outbound relationships. IP Street will assist you in better understanding patent duration and patent analytics.